Sputtering target titanium

Product Introduction 

Sputtering Target Titanium — High-Purity Titanium Targets for Precision Thin Film Deposition

Sputtering target titanium from Baoji Huacan New Metal Materials Co., Ltd. delivers purity grades from 99.5% to 99.995%, ensuring reliable thin film deposition across semiconductor, optical, solar, and decorative coating applications. Each titanium target is made with homogenous density and ultra-fine grain structure for reliable sputtering rates and uniform film thickness. With over 10 years of titanium machining experience, 40+ precision CNC machines, and 1,000+ tons of annual production capacity, Baoji Huacan offers full customization — from dimensions to backing plate compatibility.

Product Specification & OEM Customization

 

Parameter	Details
Material Grade	Grade 2 (TA2), Grade 5 (Ti-6Al-4V), Grade 7, Grade 9, Grade 23
Purity Range	99.5% – 99.995% (2N5 to 4N5)
Density	≥99.7% of theoretical density
Grain Size	≤30μm (≤10μm available for VLSI applications)
Oxygen Content	Controllable to <300 ppm
Dimensions	Customized (diameter, length, width, thickness per drawing)
Target Shape	Planar (round, rectangular), Rotatable tube — customized
Backing Plate	Cu, Mo, Stainless Steel — optional bonding
Surface Finish	Customized (natural titanium, polished, machined)
Compatible Systems	PVD, CVD, Magnetron Sputtering, Vacuum Coating
Material Standard	ASTM B265, ASTM F67/F136, AMS, DIN, ISO
Certification	ISO 9001, MTC, EN10204 3.1, COC available

Product Application

Semiconductor & Microelectronics Titanium target deposit Ti and TiN barrier layers in the VLSI/ULSI device manufacture. These layers inhibit copper electromigration into silicon substrates and also function as adhesion boosters for tungsten contact plugs.

Flat Panel Displays (TFT-LCD / OLED) Titanium films for manufacturing of low-resistivity gate electrodes and high-adhesion interface layers for ITO conductors. Targets must be uniformly deposited on large format glass substrates to avoid pixel errors.

Low-E Architectural & Automotive Glass Rotatable titanium targets are used to produce sacrificial blocker layers to preserve silver infrared reflecting layers from oxidation during high temperature tempering – maintaining long term glass energy efficiency.

Decorative & Hard Coatings – Reactive sputtering with nitrogen generates TiN coatings with a hardness of more than 2000 HV on cutting tools, drill bits and precision watch components. This needs targets with good gas compatibility of reactivity.

Solar & Optics Titanium thin films are used as functional layers in photovoltaic modules and optical filter stacks and need precise thickness control and good deposition efficiency.

Why Choose Us

Why Choose Our Sputtering Target Titanium

Choosing the right titanium target directly impacts your film quality, production yield, and equipment performance. Here's why procurement engineers and coating specialists trust Baoji Huacan.

Our titanium targets achieve full density exceeding 99.7% of theoretical density. This minimizes internal voids that cause micro-arcing and particle contamination — a critical concern in sub-7nm semiconductor nodes.

We apply advanced thermomechanical processing to achieve average grain sizes below 30μm. Uniform equiaxed grain structures ensure consistent erosion rates across the entire target surface, extending target service life and reducing downtime.

Low oxygen impurity control (target: <300 ppm) prevents resistivity issues in deposited films. This level of chemical cleanliness directly supports high-performance barrier and adhesion layers in VLSI device fabrication.

Manufacturing Process

Baoji Huacan's titanium target manufacturing begins with high-purity ingot melting using vacuum arc remelting (VAR) and plasma arc melting (PAM) furnaces. This ensures excellent chemical homogeneity and low gaseous impurity levels from the very first step.

Ingots undergo controlled thermomechanical processing — combining precise forging sequences with rolling and heat treatment. This refines grain structure to the target size range, producing the uniform equiaxed microstructure critical for stable sputtering performance.

Final dimensions are achieved through precision CNC machining on our 40+ advanced machining centers. Tight tolerances are maintained throughout, and each target surface is finished according to customer specifications before bonding and inspection.

Receiving Drawings

Annealing

Developing Machining Process

Finish Machining

Preparing Raw Materials

Deburring

Rough Machining

Deburring

Manufacturing Capability

melting	melting	forging	forging	rolling

Quality Control

Raw material verification begins with spectrometer-based chemical composition analysis and supplier certification checks. Only qualified ingots enter production.

In-process monitoring tracks dimensional compliance at every manufacturing stage — from forging through final machining. Ultrasonic testing detects internal voids, cracks, or inclusions without damaging the product.

Finished targets are examined using CMM, micrometers and surface roughness gages. Tensile strength, Hardness and other Mechanical Properties are checked to ASTM, AMS and DIN standards.

Each shipment is accompanied by a complete paperwork package including: material test certificates (MTC), inspection reports, EN10204 3.1 documentation, certificates of conformity (CoC) and material traceability records.

Certifications

Baoji Huacan is ISO 9001 quality management system certified and covers all the steps from raw material selection to the final inspection. Each purchase may be accompanied by material test certificates (MTC), EN10204 3.1 and CoC documentation on request.

Packaging & Shipping

Air freight is available for urgent orders. Sea freight provides cost-effective bulk delivery. Export packaging complies with international shipping standards for fragile precision components.

FAQ

Q: What purity grade should I select for semiconductor applications?

A：For barrier layer and adhesion layer applications in VLSI devices, we recommend 99.99% (4N) or 99.995% (4N5) purity with oxygen content controlled below 300 ppm.

Q: Can you manufacture targets compatible with specific sputtering equipment brands?

A：Yes. Submit your equipment model or technical drawing. We manufacture according to customer specifications and are compatible with major PVD system platforms.

Q: What is the minimum order quantity?

A：We support prototype quantities through to mass production. Contact us to discuss your project volume and timeline.

Q: How long does production take?

A：Lead time depends on specifications and order volume. Contact our team at Joy@hc-titanium.com for a confirmed production schedule.

Q: Do you provide material certifications?

A：Yes. Full documentation including MTC, EN10204 3.1, CoC, and inspection reports are provided with every order.

Contact Us

Ready to source high-purity sputtering target titanium for your next project? Contact us at sherry@hc-titanium.com  for a fast, professional response.